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Process Specialties introduces a new line of step height
standards to the semiconductor, FPD and nanotechnology industries. The new dual step height standards are offered in a wide range of nominal thicknesses
for the calibration, monitoring and standardization of all step height metrology tools.
The new dual step height design from PSI offers the advantage of two NIST traceable, calibrated thickness steps on each standard.
This establishes the linearity of tools in specific height ranges -without the need to load or set-up an additional standard.
PSI's dual
thickness technology obsoletes other single, nominal standards and
is a more practical and cost effective alternative. The new Dual
Step Height Standards are built from precision thermal Silicon Dioxide for
mechanical profilers and AFM tools.
The
dual thickness design also incorporates useful diagnostic features
for stylus integrity, alignment and magnification. The new standards
also have pattern recognition alignment marks (PRAM) for auto loading.
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